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The standard solution for hot filament ion beam processing

Key Design Features

  • Functional system for easy and quick filament replacement
  • Compact discharge housing
  • Internal and external mounting configurations
  • Functional ceramics for easy and quick maintenance
  • Special grid insulation and adjustment system


  • Fully noble gas, and nitrogen gas capability
  • Grid systems from different shape and material for optimum process adaptation
  • Quick and easy maintenance and long working cycles


Technical Specifications


KF/F 40

KF/I 40


Flange mounted Kaufman source with multi aperture extraction grid

Internally mounted Kaufman source with multi-aperture extraction grid

Source materials:

Discharge lining: Al2O3


Grids: C or Mo


Filament holder: Mo


Permanent magnets: AlNiCo


Housing: Stainless steel


Filament: Tungsten

Grid types:

2 or 3 grid system


3 standard systems with different focusing length


See Fig. above (without neutralisation)


~4.5 kg

~2.5 kg


DN 100 CF

2 DN 40 CF media feedthroughs

Cathode current:

Maximum 30 A

Discharge current / voltage:

                                        Maximum 6 A / 150 V

Ion current:

Maximum 25 mA (Dependent on grid type and operation condition)

Ion energy:

~50 to 1500 eV

Accelerator voltage:

0 to –1000 V

Process gases:

Noble gases, N2 (no reactive gases)


Gas flow :

2 to 7 sccm

Fitting: 6 mm Swagelock

2 to 7 sccm

Fitting: 1/8” Swagelock (Air side and vacuum side)

Electrical connections:

               HV-DC: BNC

               HC-DC: Power push on

Air side:           BNC, Power push on

Vacuum side:   Power push on

0.5 m vacuum cables included


Dimensions / Size

 External Mounted Kaufman SourceInternal mounted


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