top
logo

   

The solution for filament free plasma processing

Key Design Features

  • Filament-free operation based on a simple, compact microwave power coupling
  • Permanent magnets for use of the Electron Cyclotron Resonance (ECR)

Advantages

  • Fully noble gas and inert gases, Oxygen too; restricted for reactive gases
  • Minimum maintenance and long lifetime, maintenance cycles over 300 h

 

 

 

Technical Specifications

 

EC/F 125

Type:

Flange mounted ECR plasma source with permanent magnets

Source materials:

Flange: non magnetizable stainless steel

 

Vacuum separation of the microwave antenna: SiO2 cup

 

Permanent magnets: NdFeB, Ni coated

 

Magnetic shield inside the vacuum chamber: non

Size:

Insertion depth: 44 mm, Diameter: 220 mm

Weight:

~11.5 kg

Flange:

DN 200

Microwave power:

~125 to 600 W at 2.45 GHz

Plasma density:

Maximum 1012 cm-3 (Dependent on process gas and operation condition)

Process gases:

Noble gases, N2 , and O2, (no restrictions)

Halogen containing gases (lifetime of Quartz cup reduced)

Process pressure:

5*10-4 mbar to 2*10-2 mbar ; Fitting: 6 mm Swagelock

Cooling water:

et least 3 l/min ; Fitting: 8 mm Swagelock and quick-release coupling for ¼” hose

 

 

Dimensions / Size

 


bottom
top
© 2013 IOT GmbH  Impressum   Sitemap

bottom
Real time web analytics, Heat map tracking