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 The unique solution for large scale ion beam processing

Key Design Features

  • Filament-free source operation based on a simple, compact microwave power coupling
  • Permanent magnets for use of the Electron Cyclotron Resonance (ECR)
  • Flange mounting configuration
  • Functional ceramics for easy and quick maintenance
  • Special grid insulation and adjustment system



  • Fully noble gas, and oxygen; restricted for reactive gases
  • Grid systems from different shape and material for optimum process adaptation
  • Modular concept up to 2 m length
  • Minimum maintenance and long lifetime, maintenance cycles over 300 h
  • Homogeneous beam profile over the total length, 80%


Technical Specifications


EC/L 800


Flange mounted microwave excited ion source with multiapertur extraction grids

Discharge modules:


Source materials:

Discharge lining: Al2O3


Grids: Graphite


Vacuum separation of the microwave antenna: SiO2 cup


Permanent magnets: NdFeB


Housing: Stainless steel


Magnetic shield: Ni coated steel

Grid types:

2 grid system


2 standard systems (focussing and plane)


Immerse depth: standard 104.5 mm


235 mm x 875 mm (without flange)


~80 kg


Non-standard rectangular flange with O-ring seal


340 mm x 975 mm

Microwave power:

~125 to 400 W at 2.45 GHz for each module

Ion current:

Maximum 1200 mA at 1000 V (1.2 kW)

Ion energy:

~100 to 1000 eV

Accelerator voltage:

0 to –1000 V

Process gases:

Noble gases, N2 (No restrictions)

O2,and Halogen containing gases (Grid lifetime reduced)

Gas flow :

25 … 40 sccm, plug in connector for 6 mm hose

Cooling water:

1.5 l/min, plug in connectors for 6 mm hose

Linear ECR Broad Beam Ion Source

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