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The unique solution for filament free ion beam processing

 

RF/F 40 and RF/I 40

Key Design Features

  • Filamentfree source operation based on a simple, rugged inductive power coupling
  • Compact impedance matching inside the source housing
  • Internal and external mounting configurations
  • Functional ceramics for easy and quick maintenance
  • Special grid insulation and adjustment system

 

Advantages

  • Fully noble gas, oxygen, and other reactive gas capability
  • Grid systems from different shape and material for optimum process adaptation
  • RF power supply via 50 W cable without additional matching unit
  • Minimum maintenance and long lifetime

 

Technical Specification

 

RF/F 40

RF/I 40

Type:

Flange mounted RF excited ion source with multiapertur extraction grids

Internally mounted RF excited ion source with multiapertur extraction grids

Source

Discharge lining: Al2O3

materials:

Grids: C or Mo

 

RF coil: Silver plated and water cooled Cu

 

Permanent magnets: AlNiCo

 

Housing: Stainless steel

 

RF-matching components: Cu and Al2O3

Grid types:

2 or 3 grid system

 

3 standard systems with different focusing length

Size:

See Fig. above (without neutralisation)

Weight:

~1.8 kg

~1.2 kg

Flange:

DN 100 CF

3 DN 40 CF media feedthroughs

RF power

~75 to 300 W at 13.56 MHz

Ion current:

Maximum 50 mA (Dependent on grid type and operation condition)

Ion energy:

~50 to 2000 eV

Accelerator voltage:

0 to –1000 V

Process gases:

Noble gases, O2, N2, CXHY (No restrictions)

Halogen containing gases (Grid lifetime reduced)

Gas flow :

1 to 10 sccm

Fitting: 6 mm Swagelock

1 to 10 sccm

Fitting: 1/8” Swagelock (Air and vacuum)

Cooling water:

1.5 l/min

Fitting: 6 mm Swagelock

1.5 l/min

Fitting: 6 mm Swagelock (Air and vacuum side)

Electrical connections:

RF: Coaxial type N

DC: BNC

RF:   Coaxial type N (Air and vacuum)

DC:  BNC (Air side), Power push on

      (Vacuum side) 0.5 m vacuum cables

 RF Broad Beam Ion Source


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