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A unique ECR broad beam source for thin film processing
| Typ | Zeitschriftenartikel |
| Autor | Michael Zeuner |
| Autor | Frank Scholze |
| Autor | Horst Neumann |
| Autor | Thomas Chassé |
| Autor | Gunther Otto |
| Autor | Dietmar Roth |
| Autor | Anke Hellmich |
| Autor | Berthold Ocker |
| URL | http://www.sciencedirect.com/science/article/pii/S0257897201011446 |
| Band | 142–144 |
| Seiten | 11-20 |
| Publikation | Surface and Coatings Technology |
| ISSN | 0257-8972 |
| Datum | Juli 2001 |
| Extra | 00016 |
| Zeitschriften-Abkürzung | Surface and Coatings Technology |
| DOI | 10.1016/S0257-8972(01)01144-6 |
| Heruntergeladen am | Do 06 Mär 2014 20:48:21 CET |
| Bibliothekskatalog | ScienceDirect |
| Zusammenfassung | We present the special microwave excited ECR (electron cyclotron resonance) type broad beam ion source EC/A 125 together with first results in ion beam deposition. Our source concept overcomes different disadvantages of common broad beam ion sources. By means of a modular source design and an autotuning microwave power supply, an adaptation at different process requirements is possible. The efficiency of the source is demonstrated analysing the performance in inert and reactive environment. We analyse and discuss the resulting beam composition and draw important conclusions on the plasma-chemical processes occurring in the source from the measurement of the ion energy distributions. The source is operated at the CYBERITE ion beam equipment and results in deposition of magneto-resistive films and multilayer films are illustrated. |
| Hinzugefügt am | Do 06 Mär 2014 20:48:21 CET |
| Geändert am | Do 06 Mär 2014 20:48:23 CET |
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IMPROVED PROPERTIES OF ACRYLATE-BASED NANOCOMPOSITES BY 172 NM IRRADIATION
| Typ | Zeitschriftenartikel |
| Autor | Frank Bauer |
| Autor | Ulrich Decker |
| Autor | Carsten Riedel |
| Seiten | 149 |
| Publikation | Radiation Curing of Composites for Enhancing the Features and Utility in Health Care and Industry |
| Extra | 00000 |
| Hinzugefügt am | Do 06 Mär 2014 20:50:43 CET |
| Geändert am | Do 06 Mär 2014 20:50:45 CET |
Observation of the Magnetic Separatrix Between a Magnetron and an Electron-Cyclotron Resonance Discharge
| Typ | Zeitschriftenartikel |
| Autor | Thomas Welzel |
| Autor | K. Barucki |
| Autor | K. Ellmer |
| Band | 39 |
| Ausgabe | 11 |
| Seiten | 2464-2465 |
| Publikation | IEEE Transactions on Plasma Science |
| ISSN | 0093-3813 |
| Datum | November 2011 |
| Extra | 00000 |
| DOI | 10.1109/TPS.2011.2149539 |
| Bibliothekskatalog | IEEE Xplore |
| Zusammenfassung | A circular planar magnetron sputtering source has been combined with an electron-cyclotron resonance (ECR) plasma source to reduce the operating voltage of the magnetron in order to avoid high-energetic particle bombardment of sensitive thin films during deposition. Although the ECR source produces a downstream plasma density of several 1010 cm-3, the voltage reduction of the magnetron is limited to only a few percent. Using a geometry with the ECR source facing the magnetron target for maximum coupling, the shape of the discharge clearly shows a magnetic shielding of the magnetron against the ECR discharge limiting the electron injection into the magnetron torus. |
| Hinzugefügt am | Do 06 Mär 2014 20:52:26 CET |
| Geändert am | Do 06 Mär 2014 20:52:28 CET |
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- IEEE Xplore Abstract Record
Optimisation and characterisation of a TCP type RF broad beam ion source
| Typ | Zeitschriftenartikel |
| Autor | Michael Zeuner |
| Autor | Frank Scholze |
| Autor | Bernd Dathe |
| Autor | Horst Neumann |
| URL | http://www.sciencedirect.com/science/article/pii/S0257897201012191 |
| Band | 142–144 |
| Seiten | 39-48 |
| Publikation | Surface and Coatings Technology |
| ISSN | 0257-8972 |
| Datum | Juli 2001 |
| Extra | 00027 |
| Zeitschriften-Abkürzung | Surface and Coatings Technology |
| DOI | 10.1016/S0257-8972(01)01219-1 |
| Heruntergeladen am | Do 06 Mär 2014 20:42:48 CET |
| Bibliothekskatalog | ScienceDirect |
| Zusammenfassung | A very compact type of broad beam ion source based on transformer coupled plasma excitation (TCP) is described. Our ion source consists of a cylindrical RF coil surrounding the discharge vessel and a very compact, patented matching unit from special ceramics capacitors attached directly to the discharge arrangement. However, the TCP excitation as well as the sophisticated layout of the matching unit require an optimum source arrangement due to the beam parameters, the source lifetime and the performance of the RF elements. For that reason, a global discharge model was applied together with an RF replacement circuit diagram to calculate for the optimum source layout. An advanced plasma and beam diagnostics is used for controlling the source performance due to beam composition, beam profile and ion energy distribution. In this way, our RF source is adapted to different beam requirements in inert and reactive beam processes for etching, modification and sputter deposition. |
| Hinzugefügt am | Do 06 Mär 2014 20:42:48 CET |
| Geändert am | Do 06 Mär 2014 20:42:51 CET |
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Spatially resolved measurements of plasma parameters in a broad-beam ion source
| Typ | Zeitschriftenartikel |
| Autor | Dieter Flamm |
| Autor | Michael Zeuner |
| URL | http://www.sciencedirect.com/science/article/pii/S0257897299001231 |
| Band | 116–119 |
| Seiten | 1089-1092 |
| Publikation | Surface and Coatings Technology |
| ISSN | 0257-8972 |
| Datum | September 1999 |
| Extra | 00004 |
| Zeitschriften-Abkürzung | Surface and Coatings Technology |
| DOI | 10.1016/S0257-8972(99)00123-1 |
| Heruntergeladen am | Do 06 Mär 2014 20:49:51 CET |
| Bibliothekskatalog | ScienceDirect |
| Zusammenfassung | We measured spatially resolved plasma parameters inside the discharge chamber of a broad-beam ion source using the Langmuir-probe technique. Radial profiles of non-uniform charge-carrier densities between 1010 and 1011 cm−3 are detected which depend on discharge current and voltage. The plasma potential is determined as being equal to the anode potential. Two maxima characterize the electron-energy distribution, a low-energy one produced by thermalized electrons and a second maximum of primary electrons accelerated in the filament sheath. The strength of the multipole magnetic field of the ion source strongly affects the spatial charge-carrier distribution. At a small magnetic-field strength the radial carrier-density distribution is more uniform than at a strong one. These different radial charge-carrier densities in the discharge chamber are also reflected in the extracted ion-beam profiles and ion-beam currents. |
| Hinzugefügt am | Do 06 Mär 2014 20:49:51 CET |
| Geändert am | Do 06 Mär 2014 20:49:53 CET |
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UV curing and matting of acrylate nanocomposite coatings by 172 nm excimer irradiation
| Typ | Zeitschriftenartikel |
| Autor | Frank Bauer |
| Autor | Ulrich Decker |
| Autor | Konstanze Czihal |
| Autor | Reiner Mehnert |
| Autor | Carsten Riedel |
| Autor | Marion Riemschneider |
| Autor | Rolf Schubert |
| Autor | Michael R. Buchmeiser |
| URL | http://www.sciencedirect.com/science/article/pii/S0300944008001999 |
| Band | 64 |
| Ausgabe | 4 |
| Seiten | 474-481 |
| Publikation | Progress in Organic Coatings |
| ISSN | 0300-9440 |
| Datum | März 2009 |
| Extra | 00000 |
| Zeitschriften-Abkürzung | Progress in Organic Coatings |
| DOI | 10.1016/j.porgcoat.2008.08.009 |
| Heruntergeladen am | Do 06 Mär 2014 20:43:38 CET |
| Bibliothekskatalog | ScienceDirect |
| Zusammenfassung | For UV-curable acrylate coatings reinforced by silica nanoparticles, the effect of 172 nm excimer irradiation on the surface roughness has been studied. A dual UV lamp set-up consisting of a 172 nm excimer lamp and a mercury arc lamp allowed obtaining gloss levels down to 0.5 units (at 60°) depending on the acrylate formulation and curing conditions. Moreover, UV matt-finished sample showed enhanced surface hardness and increased chemical resistance. It is assumed that 172 nm excimer irradiation resulted in a higher network density via additional cross-linking reactions. To study the depth profile of acrylate conversion for coatings cured by the combination of a 172 nm excimer lamp (accountable for surface curing) and a mercury arc lamp (responsible for through curing), FTIR microscopy as well as (Ge)ATR-FTIR having an IR penetration depth of less than 0.5 μm have been applied. Providing the presence of a photoinitiator as well as the absence of oxygen inhibition, similar degrees of double bond conversion of about 90% were observed on the entire area of the cross-section of the coating, i.e. the wavelength of UV irradiation was found to have no significant impact on acrylate conversion. |
| Hinzugefügt am | Do 06 Mär 2014 20:43:38 CET |
| Geändert am | Do 06 Mär 2014 20:43:41 CET |
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UV curing and matting of acrylate nanocomposite coatings by 172 nm excimer irradiation, Part 2
| Typ | Zeitschriftenartikel |
| Autor | Frank Bauer |
| Autor | Ulrich Decker |
| Autor | Sergej Naumov |
| Autor | Carsten Riedel |
| URL | http://www.sciencedirect.com/science/article/pii/S0300944010001773 |
| Band | 69 |
| Ausgabe | 3 |
| Seiten | 287-293 |
| Publikation | Progress in Organic Coatings |
| ISSN | 0300-9440 |
| Datum | November 2010 |
| Extra | 00000 |
| Zeitschriften-Abkürzung | Progress in Organic Coatings |
| DOI | 10.1016/j.porgcoat.2010.07.001 |
| Heruntergeladen am | Do 06 Mär 2014 20:50:05 CET |
| Bibliothekskatalog | ScienceDirect |
| Zusammenfassung | To elucidate the effect of short-wavelength vacuum UV (VUV) irradiation on the UV curing and matting of acrylate formulations, a real-time (ATR) FTIR spectrometer attached to a UV lamp set-up consisting of a monochromatic 172 nm (Xe2*) excimer lamp or a polychromatic medium pressure mercury arc lamp has been applied. In the presence of a photoinitiator, both the 172 nm excimer lamp and the mercury lamp yielded a similar degree of acrylic C<img border="0" alt="double bond; length as m-dash" src="http://origin-cdn.els-cdn.com/sd/entities/dbnd" class="glyphImg">C bond conversion, i.e. the wavelength of UV irradiation was found to have no significant impact on acrylate conversion. But, short-wavelength VUV irradiation of acrylates results in radical formation and self-initiation of the photopolymerization, i.e. photoinitiator-free curing of acrylates. Furthermore, real-time (ATR) FTIR spectroscopy showed a decrease of the intensity of C<img border="0" alt="double bond; length as m-dash" src="http://origin-cdn.els-cdn.com/sd/entities/dbnd" class="glyphImg">O vibrations by 172 nm irradiation within thin layers (<1 μm). This radical formation via C<img border="0" alt="double bond; length as m-dash" src="http://origin-cdn.els-cdn.com/sd/entities/dbnd" class="glyphImg">O bond activation is assumed to occur at the surface of thoroughly cured films yielding a higher network density of the coating via radical recombination reactions. Thus, UV-matted acrylate coatings show enhanced surface hardness and improved chemical resistance. |
| Hinzugefügt am | Do 06 Mär 2014 20:50:05 CET |
| Geändert am | Do 06 Mär 2014 20:50:08 CET |
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