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UV Broschüre deutsch(PDF)

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  • A unique ECR broad beam source for thin film processing

    Typ Zeitschriftenartikel
    Autor Michael Zeuner
    Autor Frank Scholze
    Autor Horst Neumann
    Autor Thomas Chassé
    Autor Gunther Otto
    Autor Dietmar Roth
    Autor Anke Hellmich
    Autor Berthold Ocker
    URL http://www.sciencedirect.com/science/article/pii/S0257897201011446
    Band 142–144
    Seiten 11-20
    Publikation Surface and Coatings Technology
    ISSN 0257-8972
    Datum Juli 2001
    Extra 00016
    Zeitschriften-Abkürzung Surface and Coatings Technology
    DOI 10.1016/S0257-8972(01)01144-6
    Heruntergeladen am Do 06 Mär 2014 20:48:21 CET
    Bibliothekskatalog ScienceDirect
    Zusammenfassung We present the special microwave excited ECR (electron cyclotron resonance) type broad beam ion source EC/A 125 together with first results in ion beam deposition. Our source concept overcomes different disadvantages of common broad beam ion sources. By means of a modular source design and an autotuning microwave power supply, an adaptation at different process requirements is possible. The efficiency of the source is demonstrated analysing the performance in inert and reactive environment. We analyse and discuss the resulting beam composition and draw important conclusions on the plasma-chemical processes occurring in the source from the measurement of the ion energy distributions. The source is operated at the CYBERITE ion beam equipment and results in deposition of magneto-resistive films and multilayer films are illustrated.
    Hinzugefügt am Do 06 Mär 2014 20:48:21 CET
    Geändert am Do 06 Mär 2014 20:48:23 CET

    Tags:

    • Broad ion beam
    • GMR Spin valve sensor
    • Mass spectrometry
    • Multilayer film

    Anhänge

    • ScienceDirect Snapshot
  • IMPROVED PROPERTIES OF ACRYLATE-BASED NANOCOMPOSITES BY 172 NM IRRADIATION

    Typ Zeitschriftenartikel
    Autor Frank Bauer
    Autor Ulrich Decker
    Autor Carsten Riedel
    Seiten 149
    Publikation Radiation Curing of Composites for Enhancing the Features and Utility in Health Care and Industry
    Extra 00000
    Hinzugefügt am Do 06 Mär 2014 20:50:43 CET
    Geändert am Do 06 Mär 2014 20:50:45 CET
  • Observation of the Magnetic Separatrix Between a Magnetron and an Electron-Cyclotron Resonance Discharge

    Typ Zeitschriftenartikel
    Autor Thomas Welzel
    Autor K. Barucki
    Autor K. Ellmer
    Band 39
    Ausgabe 11
    Seiten 2464-2465
    Publikation IEEE Transactions on Plasma Science
    ISSN 0093-3813
    Datum November 2011
    Extra 00000
    DOI 10.1109/TPS.2011.2149539
    Bibliothekskatalog IEEE Xplore
    Zusammenfassung A circular planar magnetron sputtering source has been combined with an electron-cyclotron resonance (ECR) plasma source to reduce the operating voltage of the magnetron in order to avoid high-energetic particle bombardment of sensitive thin films during deposition. Although the ECR source produces a downstream plasma density of several 1010 cm-3, the voltage reduction of the magnetron is limited to only a few percent. Using a geometry with the ECR source facing the magnetron target for maximum coupling, the shape of the discharge clearly shows a magnetic shielding of the magnetron against the ECR discharge limiting the electron injection into the magnetron torus.
    Hinzugefügt am Do 06 Mär 2014 20:52:26 CET
    Geändert am Do 06 Mär 2014 20:52:28 CET

    Tags:

    • circular planar magnetron sputtering source
    • cyclotron resonance
    • deposition process
    • discharges (electric)
    • downstream plasma density
    • electron-cyclotron resonance discharge
    • electron-cyclotron resonance plasma source
    • electron injection process
    • Fault location
    • high-energetic particle bombardment
    • Magnetic Confinement
    • Magnetic noise
    • Magnetic resonance
    • Magnetic separation
    • magnetic separatrix
    • Magnetic shielding
    • magnetic shielding analysis
    • magnetron torus
    • Perpendicular magnetic recording
    • plasma density
    • plasma deposition
    • plasma materials processing
    • plasma measurements
    • Plasmas
    • plasma sources
    • shielding
    • sputtering
    • thin films

    Anhänge

    • IEEE Xplore Abstract Record
  • Optimisation and characterisation of a TCP type RF broad beam ion source

    Typ Zeitschriftenartikel
    Autor Michael Zeuner
    Autor Frank Scholze
    Autor Bernd Dathe
    Autor Horst Neumann
    URL http://www.sciencedirect.com/science/article/pii/S0257897201012191
    Band 142–144
    Seiten 39-48
    Publikation Surface and Coatings Technology
    ISSN 0257-8972
    Datum Juli 2001
    Extra 00027
    Zeitschriften-Abkürzung Surface and Coatings Technology
    DOI 10.1016/S0257-8972(01)01219-1
    Heruntergeladen am Do 06 Mär 2014 20:42:48 CET
    Bibliothekskatalog ScienceDirect
    Zusammenfassung A very compact type of broad beam ion source based on transformer coupled plasma excitation (TCP) is described. Our ion source consists of a cylindrical RF coil surrounding the discharge vessel and a very compact, patented matching unit from special ceramics capacitors attached directly to the discharge arrangement. However, the TCP excitation as well as the sophisticated layout of the matching unit require an optimum source arrangement due to the beam parameters, the source lifetime and the performance of the RF elements. For that reason, a global discharge model was applied together with an RF replacement circuit diagram to calculate for the optimum source layout. An advanced plasma and beam diagnostics is used for controlling the source performance due to beam composition, beam profile and ion energy distribution. In this way, our RF source is adapted to different beam requirements in inert and reactive beam processes for etching, modification and sputter deposition.
    Hinzugefügt am Do 06 Mär 2014 20:42:48 CET
    Geändert am Do 06 Mär 2014 20:42:51 CET

    Tags:

    • Broad ion beam
    • Discharge model
    • Mass spectrometry

    Anhänge

    • ScienceDirect Snapshot
  • Spatially resolved measurements of plasma parameters in a broad-beam ion source

    Typ Zeitschriftenartikel
    Autor Dieter Flamm
    Autor Michael Zeuner
    URL http://www.sciencedirect.com/science/article/pii/S0257897299001231
    Band 116–119
    Seiten 1089-1092
    Publikation Surface and Coatings Technology
    ISSN 0257-8972
    Datum September 1999
    Extra 00004
    Zeitschriften-Abkürzung Surface and Coatings Technology
    DOI 10.1016/S0257-8972(99)00123-1
    Heruntergeladen am Do 06 Mär 2014 20:49:51 CET
    Bibliothekskatalog ScienceDirect
    Zusammenfassung We measured spatially resolved plasma parameters inside the discharge chamber of a broad-beam ion source using the Langmuir-probe technique. Radial profiles of non-uniform charge-carrier densities between 1010 and 1011 cm−3 are detected which depend on discharge current and voltage. The plasma potential is determined as being equal to the anode potential. Two maxima characterize the electron-energy distribution, a low-energy one produced by thermalized electrons and a second maximum of primary electrons accelerated in the filament sheath. The strength of the multipole magnetic field of the ion source strongly affects the spatial charge-carrier distribution. At a small magnetic-field strength the radial carrier-density distribution is more uniform than at a strong one. These different radial charge-carrier densities in the discharge chamber are also reflected in the extracted ion-beam profiles and ion-beam currents.
    Hinzugefügt am Do 06 Mär 2014 20:49:51 CET
    Geändert am Do 06 Mär 2014 20:49:53 CET

    Tags:

    • Ion source
    • Langmuir probe
    • Plasma parameters
    • Surface modification

    Anhänge

    • ScienceDirect Snapshot
  • UV curing and matting of acrylate nanocomposite coatings by 172 nm excimer irradiation

    Typ Zeitschriftenartikel
    Autor Frank Bauer
    Autor Ulrich Decker
    Autor Konstanze Czihal
    Autor Reiner Mehnert
    Autor Carsten Riedel
    Autor Marion Riemschneider
    Autor Rolf Schubert
    Autor Michael R. Buchmeiser
    URL http://www.sciencedirect.com/science/article/pii/S0300944008001999
    Band 64
    Ausgabe 4
    Seiten 474-481
    Publikation Progress in Organic Coatings
    ISSN 0300-9440
    Datum März 2009
    Extra 00000
    Zeitschriften-Abkürzung Progress in Organic Coatings
    DOI 10.1016/j.porgcoat.2008.08.009
    Heruntergeladen am Do 06 Mär 2014 20:43:38 CET
    Bibliothekskatalog ScienceDirect
    Zusammenfassung For UV-curable acrylate coatings reinforced by silica nanoparticles, the effect of 172 nm excimer irradiation on the surface roughness has been studied. A dual UV lamp set-up consisting of a 172 nm excimer lamp and a mercury arc lamp allowed obtaining gloss levels down to 0.5 units (at 60°) depending on the acrylate formulation and curing conditions. Moreover, UV matt-finished sample showed enhanced surface hardness and increased chemical resistance. It is assumed that 172 nm excimer irradiation resulted in a higher network density via additional cross-linking reactions. To study the depth profile of acrylate conversion for coatings cured by the combination of a 172 nm excimer lamp (accountable for surface curing) and a mercury arc lamp (responsible for through curing), FTIR microscopy as well as (Ge)ATR-FTIR having an IR penetration depth of less than 0.5 μm have been applied. Providing the presence of a photoinitiator as well as the absence of oxygen inhibition, similar degrees of double bond conversion of about 90% were observed on the entire area of the cross-section of the coating, i.e. the wavelength of UV irradiation was found to have no significant impact on acrylate conversion.
    Hinzugefügt am Do 06 Mär 2014 20:43:38 CET
    Geändert am Do 06 Mär 2014 20:43:41 CET

    Tags:

    • 172 nm excimer lamp
    • Coatings
    • Matting
    • Nanocomposite
    • UV curing

    Anhänge

    • ScienceDirect Snapshot
  • UV curing and matting of acrylate nanocomposite coatings by 172 nm excimer irradiation, Part 2

    Typ Zeitschriftenartikel
    Autor Frank Bauer
    Autor Ulrich Decker
    Autor Sergej Naumov
    Autor Carsten Riedel
    URL http://www.sciencedirect.com/science/article/pii/S0300944010001773
    Band 69
    Ausgabe 3
    Seiten 287-293
    Publikation Progress in Organic Coatings
    ISSN 0300-9440
    Datum November 2010
    Extra 00000
    Zeitschriften-Abkürzung Progress in Organic Coatings
    DOI 10.1016/j.porgcoat.2010.07.001
    Heruntergeladen am Do 06 Mär 2014 20:50:05 CET
    Bibliothekskatalog ScienceDirect
    Zusammenfassung To elucidate the effect of short-wavelength vacuum UV (VUV) irradiation on the UV curing and matting of acrylate formulations, a real-time (ATR) FTIR spectrometer attached to a UV lamp set-up consisting of a monochromatic 172 nm (Xe2*) excimer lamp or a polychromatic medium pressure mercury arc lamp has been applied. In the presence of a photoinitiator, both the 172 nm excimer lamp and the mercury lamp yielded a similar degree of acrylic C<img border="0" alt="double bond; length as m-dash" src="http://origin-cdn.els-cdn.com/sd/entities/dbnd" class="glyphImg">C bond conversion, i.e. the wavelength of UV irradiation was found to have no significant impact on acrylate conversion. But, short-wavelength VUV irradiation of acrylates results in radical formation and self-initiation of the photopolymerization, i.e. photoinitiator-free curing of acrylates. Furthermore, real-time (ATR) FTIR spectroscopy showed a decrease of the intensity of C<img border="0" alt="double bond; length as m-dash" src="http://origin-cdn.els-cdn.com/sd/entities/dbnd" class="glyphImg">O vibrations by 172 nm irradiation within thin layers (<1 μm). This radical formation via C<img border="0" alt="double bond; length as m-dash" src="http://origin-cdn.els-cdn.com/sd/entities/dbnd" class="glyphImg">O bond activation is assumed to occur at the surface of thoroughly cured films yielding a higher network density of the coating via radical recombination reactions. Thus, UV-matted acrylate coatings show enhanced surface hardness and improved chemical resistance.
    Hinzugefügt am Do 06 Mär 2014 20:50:05 CET
    Geändert am Do 06 Mär 2014 20:50:08 CET

    Tags:

    • 172 nm excimer irradiation
    • Acrylate
    • Matting
    • Photoinitiator-free curing
    • UV curing

    Anhänge

    • ScienceDirect Snapshot

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